Sub-diffraction Limited Patterning And Imaging Via Multi-step Photoswitching
ID U-5387
Category Hardware, Circuits, & Sensors
Subcategory Optical Sensors
Researchers
Brief Summary
Multi-Step Photoswitching for Sub-Diffraction Limited Patterning and Imaging
Problem Statement
Optical imaging and patterning can be limited by a far-field diffraction limit. The far-field diffraction limit can limit imaging patterns or creating patterns that are spaced by a distance closer than approximately λ/2. In far-field diffraction, a diffraction pattern can be viewed at a long distance from the diffracting object, or the diffraction pattern can be viewed at the focal plane of an imaging lens.
Technology Description
University of Utah researchers have developed Sub-diffraction-limited patterning using a photoswitchable recording material. A substrate with a photoresist in a first transition state. The photoresist is configured for spectrally selective reversible transitions between at least two transition states based on a first wavelength band of illumination and a second wavelength band of illumination. An optical device selectively exposes the photoresist to a standing wave with a second wavelength in the second wavelength band to convert a section of the photoresist into a second transition state. Then modifying the standing wave relative to the substrate to further expose additional regions of the photoresist into the second transition state in a specified pattern. It can further convert one of the first and second transition states of the photoresist into an irreversible transition state, while the other of the first and second transition states remains in a reversible transition state. The photoresist can be developed to remove the regions of the photoresist in the irreversible transition state.
Benefit
- Illumination patterns that erase previous exposures can create patterns that are far smaller than the diffraction limit.
- Far-field imaging can create images of objects that are large compared to the illumination wavelength.
- Can be used for biological applications in which cells span multiple wavelengths but contain structures down to the molecular scales.
- Can be used for electrical or electrical-mechanical structures.
Publications
See also: U-5530, U-5064, U-5199
IP
Publication Number: US-2014-0199636-A1
Patent Title: Sub-Diffraction Limited Patterning and Imaging Via Multi-Step Photoswitching
Jurisdiction/Country: United States
Application Type: Non-Provisional
Contact Info
Dean Gallagher
(801) 585-0396
dean.gallagher@utah.edu
